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- 06/05/2017

Gelest, Inc. Launches SIVATE™ E610 enhanced Amine Functional Silane; Improves corrosion resistance, durability and bond strength

Chimica Oggi-Chemistry Today

Gelest, Inc. has unveiled its new SIVATETM E610 Enhanced amine functional silane, which offers improved performance with non-siliceous surfaces, improved corrosion resistance of metal substrates, superior film-forming properties in primer applications, higher bond strength in aggressive aqueous conditions, and imparts composites and primers with long-term durability in a wide range of environments.  Gelest offers SIVATE™ E610 Enhanced amine silane for use as an adhesive primer for metallic and siliceous substrates, coupling agent for thermoset and thermoplastic composites, corrosion inhibiting primer for paints and coatings on ferrous and non-ferrous substrates, and functionalization of Micro-Particles for use in adhesives and sealants.

SIVATE™ E610 Enhanced silane is a proprietary combination of a dipodal silanes with an amine functional silane. The Enhancement of silanes is effected by incorporation of functional and non-functional dipodal silanes. The dipodal silane combines with the functional silane to form a tight conformal network of siloxane bonds, reduces water adsorption at the interface and, most importantly, forms multiple oxane bonds with the substrate.

Compared to conventional silanes, which potentially bond form 3 oxane bonds, SIVATE™ E610 Enhanced amine silane can form up to 6 oxane bonds with the substrate. Theoretical studies suggest that the dipodal silanes could have up to 106x greater stability in aqueous environments.  The enhanced bond potential offers improve mechanical properties, the ability to form coatings on a greater range of substrate, and increase durability of coatings, primers and composites to long-term environmental exposure.

The introduction of SIVATE™ E610 Enhanced amine silane is an example of Gelest’s customer-centric research and development. For more information or to request samples, visit Gelest, Inc. at