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TMIn Phase Epitaxy Device Comparison of a Lauda Thermoelectric Cooler and Compressor on Cooling Circulation Water

SHU-LUNG WANG1*,YUAN-RUEY HUANG1, AY SU2,YI-FENG CHANG2, SHIH-FENG CHEN1
*Corresponding author
1. Department of Mechanical Engineering, Nanya Institute of Technology , NO.414,Sec.3, Jhongshan E. Rd., Jhongli City, Taoyuan County, 32091 Taiwan (R.O.C.)
2. Department of Mechanical Engineering, Yuan Ze University, NO.135 Yuan-Tung Rd., Jhongli City, Taoyuan County, 32003 Taiwan, (R.O.C.)

Abstract

In this study MFC/EPC had change effect with other conditions fixed about (temperature540→, time15MIN) HB T concentration were obtained by Hall-measurement modes records concentration valve. The (TMIn) crystal growth of Trial and Error, use TMIn Phase Epitaxy device Comparison of The Thermoelectric Cooler and Compressor on the Cooling Circulation water (Lauda) were dominated. By Controlling Implementation Assisted Driving the Thermoelectric Cooler in Lauda Generation Circulating Water and the same time can Control Temperature Distribution and decreased Temperature on Product effect, Expectation make the better Quality.

The other study Actual Formation Actual Formation the Thermoelectric Cooler Cooling Circulation water with Incinerator and Operation Data Throughput. futher application reference design Compressor silver, It had more evenly temperature distributed and Power Saving.


INTRODUCTION

In terms of the Lauda compressor used by TMIn phase epitaxy device companies, both the power consumption and maintenance costs are high (the failure frequency of old machines becomes increasingly high) and the autonomous maintenance ability is insufficient. Therefore, this research aimed to discuss the feasibility of using a cooling chip for cooling and temperature control. Using TMGa as an example, when the storage temperature of a thermostatic bath is 3→, the saturated vapor pressure is 86.6 mbar; when the storage temperature of a thermostatic bath is 5→, the saturated vapor pressure is 88.6 mbar. The temperature affects the temperature gradient of the interface within the reactor chamber. A carrier gas (N2; H2) and SOURCE are brought into the reactor chamber by the MFC (mass flow controller) and EPC (pressure controller), and the stability of the saturated vapor pressure will affect the stability of the products. In order to avoid the subsequent doubt for the temperature gradient, the temperature deviation control of thermostatic baths should be intensified. 


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